Articles

Date	Title	Publication
Molecular Imprints
Mar 2010	Lithography Cost of Ownership: Fact and Fiction	Semiconductor International
Sep 2009	The Industry's Coming Lithography Transition	Semiconductor International
Jun 2009	Molecular Imprints' J-FILN Nanopatterning Solution Continues to Gain Momentum in NVM Markets	azonano
May 2008	MII Tackles Patterned Media Opportunity	Semiconductor International
Lithography
Aug 2009	The Industry's Coming Lithography Transition	Reed Business Information
Mar 2009	SPIE observations: EUV vs. "all other" litho	Solid State Technology
Photomask
Dec 2009	BACUS News is published monthly by SPIE for BACUS, EUV Challenge for “New Economy”	Photomask
Apr 2009	SPIE Observations: EUV vs. “All Other” Litho	Photomask
Jan 2005	SEMI Oral History Interview: Ken Rygler	SEMI
Jun 2004	Photomask Costs: Damming the Rising Tide	FutureFab
May 2004	Focus on mask yield for lower cost designs	IEEE.org
Nov 2001	DuPont Photomasks Announces Resignation of Kenneth A. Rygler; Founder of DuPont Photomasks to Assume Consulting Role	Press Release
Oct 2001	Creative ways to cut costs	EE Times
Aug 2001	Cost, manufacturability limit lithography extensions	thinfilmmfg.com
Oct 2000	AMD Successfully Utilizes Canary ESD Service From DuPont Photomasks And ION To Protect Photomasks In Fab 25	The Free Library
Jun 1999	Mask Costs Jumping	EDN
Aug 1997	Masking the Complexities of Chip Development	Wired
	High costs of mask sets and design force industry change	Semiconductors
X Initiative
Jan 2007	X architecture marks the spot for good yields, supporters say	Micro Magazine
Oct 2003	DuPont Photomasks' Results Confirm Manufacturability Using Conventional Equipment	EDACafe
Jun 2003	Waiting for X Architecture	EDN
Jun 2003	X Initiative Honors STMicroelectronics with DFM Catalyst Award	Press Release
Jun 2003	More details emerge on 90-nm X-Initiative chip	EE Times
Apr 2003	The X Architecture: Roadmap for Design for Manufacturing Methodology	X Initiative
Mar 2003	X Initiative panel makes plea for DF	EE Times
DFM
May 2008	Gauda, Inc. , the Company that Accelerates Computational Lithography, Announces its Advisory Board	Press Release
Feb 2007	DFM and DFY: Old Solutions to New Problems	Chip Design Magazine
Jul 2005	Challenges seen for seamless DFM, says expert	EE Times Asia
Jun 2005	Updated: Speakers spar over foundry-versus-IDM models	Finance Tech
Aug 2004	Hefty compute power clears up mask imaging	EE Times
Jan 2004	Wanted: New class of engineering generalists for DFM	EE Times Asia
Jan 2000	The semiconductor industry chain re-integration, wafer foundry and IDM sparked controversy prospects	wangchao.org
Confab
Jan 2010	2010 Advisory Board	The Confab